Inspico High Resolution Analysis
Dedicated Instruments:  Field Ion Microscopy & Atom Probe Tomography

Orbis - M-AP (Modular Atom Probe)

Nanotechnology is a key technology for the development of various new products and technologies. To be able to develop and produce these technologys or to ensure their quality a special kind of microscopes is necessary. Atom Probe tomography (APT) has shown, that it is able to deliver these information on the nano-scale. In our days APT is strongly bounded to the usage of state of the art dual beam microscopes. The sum of both maschines is capable to deliver astonishing results, but sometimes limited in its possibilities by their seperation.  Not mentioning the enourmous investment cost, discouraging at least small to medium size companies to invest in this technology. 

The central piece of an State of the Art Atomprobe is minituarized by using modern micromanipulaters to produce a moveable Microscope-Head. This is the Atomprobe-Shuttle 



A small side chamber had to be developed and attached to an appropiate FIB port (mostly the Airlock-Port). The chamber is necessary to achieve the necessary UHV conditions for APT. The chamber is amongst other equipped with an MCP based Delay Line Detector (Diameter 80 mm), Cool Head, Hich Voltage Connectors, Laser Ports with associated manipulating optics and transfer mechanics. 

The sample of interest is mounted onto the shuttle



Transfer

  1. Transfer of the shuttle into the FIB chamber
  2. Localisation: The micro stage electrode is rotated backwards to open the view onto the sample. Localisation of the feature of interest
  3. Milling: a) The feature of interest is milled or prepared by Lift Out procedure b) the electrode is machined by the Ion Beam
  4. Positioning: The micro stage electrode is rotated back towards the sample. Using the SEM Beam, the electrode is positioned precisely above the the milled feature.
  5.  Transfer into the M-Tap: The shuttle is transfered back into the side chamber.It is cooled down to croygenic temperatures and aligned relativ to the laser spot. APT measurement is started. 


Samples are mounted directly onto the Shuttle. Using the transfer mechanics the complete shuttle can be transferred directly into the Dual Beam instrument. Allowing direct manipulation of the sample using Dual Beam Techniques.


Optional Airlock Chamber with Cryo Option











Optional Airlock-chamber with Cryo-Option

Pneumatic attachment of the Cooling Unit




 Specs: Orbis - Modular Atom Probe -

Modular  Atom Probe + Sample Shuttle 

   

  • Atom probe shuttle
  • Mobile sample stage with piezo-driven   extraction electrode
  • automatic connection to high voltage   supply, cooling, and computer control
  • FIB mounting stage for atom probe shuttle
  •   75 mm Delay Line Detector
  • 2-dim Delay-Line-Detector 

OPTION  

  • MCP chevron stack with L/D 80:1  (12.5 micron pore size, 1 mm thick, OAR 70% or 90% active/linear diameter 75mm

 

  • all required high voltage supplies
  • front-end electronics assembly with improved temporal and spatial resolution
  • multi-hit dead-time 10 ns for  fast signals   
  • constant fraction discriminator   and pulse height analyzer
  • 8-channel TDC based on the CERN HPTDC 
  • <100psec resolution (nominal  least bit 25psec)
  • unlimited range and number of  hits with dead-time of <10 ns


  • High voltage tip supply 0-10 kV with automatic control

Cryo system

 

  • two-stage Gifford-McMahon         Cryo-Head
  • Pmax > 2 W (20 K) 
  • Pmax > 8,5 W (77 K)  
  • Cryocontroller    
  • vibration damping

  Optical System

  • Piezo driven laser mirror system
  • active alignment during measurement 
  • diameter of laser probe <10 mm  


Sample Stage


  • Five axis piezo-driven sample  stage

 Vacuum system

  • UHV single modular chamber design (p0<5 10-10 mbar)
  • UHV safe transfer between FIB and   atom probe chamber  
  • oil-free vacuum
  • pneumatic separation valve and vibration insulation to the FIB instrument   
  • SPS control incl. touchpad to operate   the vacuum
  • Camera-based alignment system  for laser beam 
  • Windows PC incl. double monitor
  • Windows-based front-end software  to operate measurement incl. active control of piezo drives and high voltages
  • Evaluation software package ‘Scito
  • full transparency in used algorithms
  • mass spectrum analyser  
  • state-of-the-art volume   reconstruction
  • 1D and 2D composition profiles and mapping
  • 3D iso-concentrations plots
  • cluster search and analysis
  • data I/O tools
  • Statistical testing tools
  • Starting set of spare parts,   basic maintenance tools, complete technical documentation including wiring diagrams and instructions for first problem solving

 

Transfer   Chamber / Airlock on request

  •  UHV chamber with: two  CF-63 flanges for transfer of the atom probe shuttle between FIB and APT, and   a further CV-63 flange to adapt custom process chambers  
  • Oil-free vacuum (turbo molecular pump) background pressure <10-8 mbar, Integration into   central vacuum control unit of the instrument
  • Ion gauge 
  • Cryogenic  cooled storage for up to four sample holders (LN2, dewar) 
  •  Cryo-stage   for the atom probe shuttle 
  • (LN2,   dewar)
  •  Temperature readout

 

 Laser Options:


1

Uv   Laser

Nanochiplaser

·        Pulse   time 500 ps

·        130 kHz repetition rate

 

2

10ps   Laser

6W Laser

·        Dioden-gepumpter, 1064 nm   Pikosekunden-Industrielaser mit einer spezifizierten Leistung von >6 W @   1000 kHz. Inklusive Controller bestehend aus Power Supply und Kühleinheit,   sowie zusätzlichem SHG/THG Modul.

·        Durchschnittsleistung bei 355 nm: 1.5   W @ 200 kHz

·        Durchschnittsleistung bei 532 nm: 1.5   W @ 200 kHz

·        Pulslänge: < 15 ps

·        Pulswiederholrate: 0 -1000 kHz

·        Strahlqualität: M^2 < 1.3

 

3

Femtossecond Laser

Wavelenght: 1030 nm +/- 3 nm

Pulsenergy: max. 10 μJ bis 500 kHz, 5 μJ bei 1 MHz,

Frequency: Singlepulse up to 2 MHz,   

Pulsewidth: < 400 fs

TEM00

 ASY-SHG/THG   Industrial Version

Wellenlänge 515 nm Effizienz: >50%

Frequenzverdreifachung

Wellenlänge 343,3 nm Effizienz:   >15%