REVOLUTIONIZING NANOTECHNOLOGY
Introducing the Hybrid Dual Beam APT Microscope System ORBIS
Nanotechnology is a key technology for the development of various new products and materials. To be able to develop and produce these technologies or to ensure their quality, a special kind of microscopes is necessary. Atom probe tomography (APT) as well as dual beam microscopy (FIB/SEM) are powerful tools in nanotechnology with enormous scientific output. The combination of both techniques is able to deliver information up to sub-nanometer resolution of many material classes. However, sometimes the application becomes limited by the spatial separation of the two techniques. To enable the analysis of liquids and soft matter by APT, we designed a new hybrid instrument which represents a combination of dual beam scanning microscope for FIB preparation and miniaturized APT chamber. The dual beam tool can be extended by all facilities to enable cryo-preparation.
Discovering new possibilities
- Standard Protocols: Compatible with established methods like lift-out technique and single tips in metal tubes.
- Vacuum Maintenance: Sample preparation and direct measurement without breaking vacuum, ideal for sensitive materials.
- Correlative Information: Simplified acquisition of EBSD, EDX, and STEM data on the same sample.
- Cryo Samples: Direct APT measurements of samples prepared under cryo conditions are possible.
- Tip Inspection: Inspection and reshaping of the sample before and after APT measurements using modern SEM instruments.
- Emitter Shape Extraction: Determination of the emitter shape before and after measurement to improve reconstruction quality.
- Micro-Tip Preparation: High-precision creation and positioning of micro-tips within the material using SEM.
- Electrode Inspection: Checking and refurbishing the microelectrode in the SEM to optimize measurement quality.
- Variable Laser Wavelengths: Options for infrared, green, and UV wavelengths for maximum flexibility.
- Compact Design: Reduced instrument size to minimize space requirements.
A small side chamber had to be developed and attached to an appropiate FIB port (mostly the Airlock-Port). The chamber is necessary to achieve the necessary UHV conditions for APT. The chamber is amongst other equipped with an MCP based Delay Line Detector (Diameter 80 mm), Cool Head, Hich Voltage Connectors, Laser Ports with associated manipulating optics and transfer mechanics.
The sample of interest is mounted onto the shuttle
Transfer
- Transfer of the shuttle into the FIB chamber
- Localisation: The micro stage electrode is rotated backwards to open the view onto the sample. Localisation of the feature of interest
- Milling: a) The feature of interest is milled or prepared by Lift Out procedure b) the electrode is machined by the Ion Beam
- Positioning: The micro stage electrode is rotated back towards the sample. Using the SEM Beam, the electrode is positioned precisely above the the milled feature.
- Transfer into the M-Tap: The shuttle is transfered back into the side chamber.It is cooled down to croygenic temperatures and aligned relativ to the laser spot. APT measurement is started.
Samples are mounted directly onto the Shuttle. Using the transfer mechanics the complete shuttle can be transferred directly into the Dual Beam instrument. Allowing direct manipulation of the sample using Dual Beam Techniques.
Optional Airlock Chamber with Cryo Option
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Optional Airlock-chamber with Cryo-Option | Pneumatic attachment of the Cooling Unit |
Specs: Orbis - Modular Atom Probe -
Modular Atom Probe + Sample Shuttle - Atom probe shuttle
- Mobile sample stage with piezo-driven extraction electrode
- automatic connection to high voltage supply, cooling, and computer control
- FIB mounting stage for atom probe shuttle
- 75 mm Delay Line Detector
- 2-dim Delay-Line-Detector
OPTION - MCP chevron stack with L/D 80:1 (12.5 micron pore size, 1 mm thick, OAR 70% or 90% active/linear diameter 75mm
- all required high voltage supplies
- front-end electronics assembly with improved temporal and spatial resolution
- multi-hit dead-time 10 ns for fast signals
- constant fraction discriminator and pulse height analyzer
- 8-channel TDC based on the CERN HPTDC
- <100psec resolution (nominal least bit 25psec)
- unlimited range and number of hits with dead-time of <10 ns
- High voltage tip supply 0-10 kV with automatic control
Cryo system
- two-stage Gifford-McMahon Cryo-Head
- Pmax > 2 W (20 K)
- Pmax > 8,5 W (77 K)
- Cryocontroller
- vibration damping
Optical System - Piezo driven laser mirror system
- active alignment during measurement
- diameter of laser probe <10 mm
Sample Stage
- Five axis piezo-driven sample stage
Vacuum system
- UHV single modular chamber design (p0<5 10-10 mbar)
- UHV safe transfer between FIB and atom probe chamber
- oil-free vacuum
- pneumatic separation valve and vibration insulation to the FIB instrument
- SPS control incl. touchpad to operate the vacuum
- Camera-based alignment system for laser beam
- Windows PC incl. double monitor
- Windows-based front-end software to operate measurement incl. active control of piezo drives and high voltages
- Evaluation software package ‘Scito’
- full transparency in used algorithms
- mass spectrum analyser
- state-of-the-art volume reconstruction
- 1D and 2D composition profiles and mapping
- 3D iso-concentrations plots
- cluster search and analysis
- data I/O tools
- Statistical testing tools
- Starting set of spare parts, basic maintenance tools, complete technical documentation including wiring diagrams and instructions for first problem solving
Transfer Chamber / Airlock on request
- UHV chamber with: two CF-63 flanges for transfer of the atom probe shuttle between FIB and APT, and a further CV-63 flange to adapt custom process chambers
- Oil-free vacuum (turbo molecular pump) background pressure <10-8 mbar, Integration into central vacuum control unit of the instrument
- Ion gauge
- Cryogenic cooled storage for up to four sample holders (LN2, dewar)
- Cryo-stage for the atom probe shuttle
- (LN2, dewar)
- Temperature readout
Laser Options: |
1 | Uv Laser Nanochiplaser · Pulse time 500 ps · 130 kHz repetition rate |
2 | 10ps Laser 6W Laser · Dioden-gepumpter, 1064 nm Pikosekunden-Industrielaser mit einer spezifizierten Leistung von >6 W @ 1000 kHz. Inklusive Controller bestehend aus Power Supply und Kühleinheit, sowie zusätzlichem SHG/THG Modul. · Durchschnittsleistung bei 355 nm: 1.5 W @ 200 kHz · Durchschnittsleistung bei 532 nm: 1.5 W @ 200 kHz · Pulslänge: < 15 ps · Pulswiederholrate: 0 -1000 kHz · Strahlqualität: M^2 < 1.3 |
3 | Femtossecond Laser
Wavelenght: 1030 nm +/- 3 nm
Pulsenergy: max. 10 μJ bis 500 kHz, 5 μJ bei 1 MHz, Frequency: Singlepulse up to 2 MHz, Pulsewidth: < 400 fs TEM00 ASY-SHG/THG Industrial Version Wellenlänge 515 nm Effizienz: >50% Frequenzverdreifachung Wellenlänge 343,3 nm Effizienz: >15% |
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